The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 1991
Filed:
Feb. 01, 1989
Klaus Korner, Berlin, DD;
Holger Fritz, Berlin, DD;
Akademie der Wissenschaften der DDR, Berlin, DD;
Abstract
The invention relates to a method and a system for measuring the microstructure of technical surfaces on the principle of the interference microscope. In accordance with the invention, the virtual planes of reflection present in the object beam space and reference beam space are imaged in an optically conjugated manner by different offsets, while the point at which the beam is split and the point where it is recombined are separated in space and a correction is performed such that the object beam and reference beam propagate parallel to one another in a common beam space. In this manner it is possible, in interferometric measurement, to eliminate undesired circular interference structures and render unnecessary any physical reference surface.