The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 1991
Filed:
Jan. 30, 1986
Applicant:
Inventor:
Burkhard Lischke, Munich, DE;
Assignee:
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
2504922 ; 2503 / ; 250398 ; 313422 ; 313432 ;
Abstract
An aperture diaphragm for lithography apparatus which has a line-shaped multi-hole structure comprising blanking electrodes for generating a plurality of individually blankable particle beam probes for lithography apparatus comprising a particle beam source, a condenser lens, a blanking diaphragm and imaging optics and a workpiece to be structured such as a semiconductor body wherein a simple aperture diaphragm is composed of a high resistant substrate such as silicon or silicon dioxide upon which blanking electrodes are formed in the form of interconnects which are provided with terminals for applying blanking voltages.