The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 1990
Filed:
Oct. 25, 1989
Yutaka Hiratsuka, Chiyoda, JP;
Tadahiro Ohmi, Sendai-shi, Miyagi, JP;
Junichi Murota, Sendai, JP;
Yoshio Fujisaki, Chiyoda, JP;
Masato Noda, Chiyoda, JP;
Yoshimitsu Kitada, Chiyoda, JP;
Terutaka Sahara, Chiyoda, JP;
Other;
Hitachi Plant Engineering & Construction Co., Ltd., both of, JP;
Abstract
A draft chamber is located within a clean room for sequentially immersing and processing carriers such as silicone wafers in a plurality of solution vessels provided in the draft chamber. In the draft chamber, a first air flow moves in a substantially horizontal direction from the front portion of the draft chamber toward the rear portion above the surfaces of solutions contained in chemical solution vessels which generate toxic gasses and a second air flow moves downward from the ceiling of the draft chamber. Thus, the toxic gasses generated from the chemical solution vessels are prevented from leaking into the clean room.