The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 1990
Filed:
Dec. 08, 1988
Applicant:
Inventors:
Susumu Tanaka, Hachioji, JP;
Yuki Hamada, Yokohama, JP;
Yasushi Sasaki, Atsugi, JP;
Yutaka Shimada, Sagamihara, JP;
Susumu Fukuoka, Shiroyama, JP;
Assignee:
Tel Sagami Limited, Kanagawa, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ; H05B / ; C23C / ;
U.S. Cl.
CPC ...
31511121 ; 118 501 ; 118715 ; 31323131 ;
Abstract
In a plasma processing apparatus of this invention, a reaction chamber opposed to a plasma generating chmaber is entirely opened at its one side surface opposing the obect to be processed, and an interval between the one side surface and the other side surface is set to be an integer multiple of a 1/2 wavelength of the microwave. A microwave oscillated by a microwave oscillator and supplied to a vacuum vessel can be converted into a plasma energy with high conversion efficiency, thereby minimizing a reflected wave.