The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 1990

Filed:

Dec. 08, 1988
Applicant:
Inventors:

Shoichi Iwanaga, Yokohama, JP;

Akio Fujiwara, Fujisawa, JP;

Takayoshi Sowa, Fujisawa, JP;

Hitoshi Yokono, Fujisawa, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437192 ; 437230 ;
Abstract

A method for forming conductor layers of substrates for mounting LSIs and the like and a fabrication method of multilayer substrates are disclosed. These methods comprise steps of forming a metal underlayer having a shape similar to that of a conductor pattern on the substrate, forming an insulation layer over portions of the substrate which are not covered by the metal underlayer, and disposing a plating layer on the metal underlayer by carrying out electroless plating while using the insulation layer as the resist and thereby forming conductors. As compared with a conventional conductor layer forming method, the number of fabrication steps is reduced. And the elimination of the surface grinding step facilitates the fabrication.


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