The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 1990

Filed:

Mar. 08, 1989
Applicant:
Inventors:

Hwa-Chi Wang, Downers Grove, IL (US);

Donnel Montgomery, Chicago, IL (US);

Horng-Yuan Wen, Brookfield, IL (US);

Gerhard Kasper, Downers Grove, IL (US);

Assignee:

American Air Liquide, Countryside, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
7386473 ;
Abstract

Disclosed is a device for particle sampling from compressed gases. The device allows for anayzing particles from compressed gases of a pressure ranging from 20 psi to 3000 psi. In the device, the formula D.sub.s =D.sub.t .sqroot.(Q.sub.s /Q.sub.t) is applicable wherein D.sub.s and D.sub.t are the probe diameter and the chamber diameter, respectively, Q.sub.s is the sampling flow rate required by monitoring instruments, and Q.sub.t is the total flow rate determined by the orifice diameter and pressure whereby the sampling velocity substantially matches the local flow velocity at the probe. In addition, a distance between the orifice and the probe is greater than L wherein L=D.sub.c / (2 tan .alpha.) where D.sub.c is the chamber diameter and .alpha. is the half angle of jet expansion.


Find Patent Forward Citations

Wang, Hwa-Chi. (1990). Pressure reduction device for particle sampling from compressed gases (U.S. Patent No. 4962673). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4962673

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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