The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 1990
Filed:
Oct. 18, 1988
Shinji Aoki, Tokyo, JP;
Akihiko Maezawa, Yokohama, JP;
Ebara Corporation, Tokyo, JP;
Abstract
In a waste gas treating method wherein waste gas is treated by adding ammonia thereto and irradiating this waste gas with electron beams, the adhesion of a by-product to the inner wall of a duct is inhibited by feeding the waste gas after irradiation with electron beams at a flow velocity of 10 m/sec or less, more preferably 5 m/sec or less, until it at least reaches a first by-product collector. The duct may have a rectangular cross-sectional configuration. Thus, it is possible to inhibit increase in the pressure loss of the waste gas being treated and enable stable operation of the waste gas treating process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile