The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 1990
Filed:
Nov. 10, 1988
Shin-ya Hasegawa, Machida, JP;
Masayuki Kato, Atsugi, JP;
Fumio Yamagishi, Ebina, JP;
Hiroyuki Ikeda, Yokohama, JP;
Takefumi Inagaki, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A high precision laser beam scanner is provided which is able to shape a beam generated by a laser, suppress the influence of jitter of a scanning beam due to mode hopping of a semiconductor laser, and reduce aberration of the scanning beam. A beam source generates a semiconductor laser beam, which is diffracted by a rotary hologram, forming a scanning beam on a surface to be scanned. An aberration correcting stationary hologram is disposed between the beam source and the rotary hologram. The stationary hologram is constructed with an object wave and a reference wave, which interfere on a stationary hologram substrate subject so that an aberration of the scanning beam on the surface to be scanned shall be corrected. The object wave is a spherical wave which has an aberration, a wave length shorter than that of the semiconductor laser beam, and an incident angle which is not vertical but is inclined with respect to the stationary hologram substrate. A method for fabricating the laser beam scanner is also provided.