The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 1990
Filed:
May. 10, 1988
Masafumi Kanetomo, Suginami, JP;
Shinichi Tachi, Sayama, JP;
Kazunori Tsujimoto, Higashiyamato, JP;
Kiichiro Mukai, Hachioji, JP;
Takahiro Daikoku, Ushiku, JP;
Shigekazu Kieda, Niihari, JP;
Keijiro Shindo, Musashimurayama, JP;
Kenshiro Tamura, Hachioji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A dry etching apparatus is disclosed, in which the temperature of an article to be etched, placed on a wafer table, is controlled by a liquefied gas and a heater and the height of the surface of the liquefied gas can be varied arbitrarily. This apparatus enables the controlling of the temperature of the article to be done with a high accuracy over a wide range of low levels. Therefore, a low-temperature dry etching operation, which cannot otherwise be attained by a conventional apparatus of this kind, can be carried out.