The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1990
Filed:
Sep. 18, 1989
Applicant:
Inventors:
Konoe Miura, Yokohama, JP;
Tameichi Ochiai, Sagamihara, JP;
Yasuhiro Kameyama, Machida, JP;
Tooru Koyama, Itami, JP;
Takashi Okabe, Itami, JP;
Tomoharu Mametani, Itami, JP;
Assignees:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Mitsubishi Chemical Industries Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430191 ; 430165 ; 430270 ; 430311 ; 430326 ;
Abstract
Disclosed herein is an antistatic photo-resist containing an antistatic agent. Since antistatic photo-resist according to the present invention is hardly charged, it can be suitably used as a mask in implanting ions into semiconductor substrate.