The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 1990

Filed:

Aug. 02, 1988
Applicant:
Inventors:

Mitsuyoshi Sato, Tokyo, JP;

Takashi Kaito, Tokyo, JP;

Yoshitomo Nakagawa, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118723 ; 118722 ; 118 501 ; 427 431 ; 427 35 ; 250398 ; 2504923 ; 239584 ;
Abstract

An apparatus for treating a sample comprises an ion source for irradiating a designated area of the sample with a focused ion beam, a vessel for storing compound to be vaporized, a heater surrounding the vessel for heating the compound to vaporize the same inside the vessel to produce compound vapor, and a nozzle for directing the compound vapor in the form of a vapor stream onto the designated area of the sample being irradiated with the focused ion beam. A valve is disposed along the fluid communication path between the vessel and the nozzle and has a closed state for blocking the flow of compound vapor through the nozzle and an open state for permitting the flow of compound vapor through the nozzle. The apparatus can be used to form pattern films on substrates, to repair defects in photo-masks and X-ray masks, and to cut or connect wiring in integrated circuits.


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