The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 1990

Filed:

Aug. 04, 1988
Applicant:
Inventors:

Kazuyuki Tomita, Osaka, JP;

Masuo Tanno, Hirakata, JP;

Yasuo Tanaka, Kadoma, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
204298 ; 20419232 ; 156345 ; 156643 ;
Abstract

The magnetron dry-etching apparatus has, behind its anode electrode (1) facing an object to be etched positioned on a cathode electrode (2), a rotatable magnet assembly comprising at least one pair of rotatable permanent magnets (12) of narrow-pie-shape, fixed on a common yoke (14) so that different polarity magnetic poles (N and S) are disposed side by side; whereby a uniform magnetic field is formed on a wafer (8) on the cathode (2) upon rotation of said magnet assembly, thereby assuring uniform etching even upon change of gas pressure of other etching conditions.


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