The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 1990

Filed:

May. 08, 1987
Applicant:
Inventors:

Takashi Yamamoto, Nagasaki, JP;

Shozo Kaneko, Nagasaki, JP;

Tadashi Gengo, Nagasaki, JP;

Joji Ichinari, Nagasaki, JP;

Hiroshi Fujiyama, Nagasaki, JP;

Yoshio Kayumi, Nagasaki, JP;

Masayoshi Murata, Nagasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118723 ; 427 39 ; 427 47 ;
Abstract

The present invention is directed to a method for forming a thin film on a substrate by the use of a glow discharge plasma which comprises generating a magnetic field in a direction which crosses an electric field for discharge at right angles and fluctuating the magnetic field. The present invention is also directed to an apparatus for practicing the above method, which apparatus is composed of a reaction vessel, means for reducing the pressure in the reaction vessel and means for introducing the feed of reaction gases to the reaction vessel, electrodes for discharge disposed face to face in the reaction vessel, a power source from which a voltage for causing a glow discharge is fed to the electrodes for discharge, a coil surrounding the electrodes for discharge, for generating a magnetic field in a direction crossing at right angles to an electric field generated between the electrodes for discharge, and an AC power source for generating a magnetic field fed to the coil, whereby a thin film is formed on a base plate supported outside the range of the discharge electric field and in parallel with the direction of the electric field.


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