The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 1990
Filed:
Oct. 25, 1988
Yoav Nissan-Cohen, Schenectady, NY (US);
Paul A Frank, Albany, NY (US);
Joseph M Pimbley, Schenectady, NY (US);
Dale M Brown, Schenectady, NY (US);
Ernest W Balch, Ballston Spa, NY (US);
Kenneth J Polasko, Latham, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
In order to solve the problem of the proximity effects which occurs in the fabrication of integrated circuit devices, a facile method is provided for automatically creating a new pattern in which variably spaced windage correction is applied over the mask. This permits the utilization of conventional design fabrication rules and systems without the concomitant problem of producing small feature sizes in isolated structures. The method produces highly desirable chip masks and is readily implemented on commercially available CAD systems presently being employed for the production of circuit masks. The method is automatic and extremely easily implemented.