The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 1989
Filed:
Oct. 05, 1987
Applicant:
Inventors:
Takao Miyamori, Tokyo, JP;
Ryozo Numazawa, Tokyo, JP;
Akihiro Sakimae, Tokyo, JP;
Hisao Onishi, Tokyo, JP;
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12P / ; C07H / ;
U.S. Cl.
CPC ...
435101 ; 536 551 ; 436123 ;
Abstract
High molecular weight hyaluronic acid can be efficiently produced by incorporating one or more compounds having at least one aromatic ring to which one or more hydroxyl groups are attached into a medium for producing hyaluronic acid by a bacterium capable of producing hyaluronic acid. By using this method, a sufficient amount of hyaluronic acid can be easily obtained without decomposing the high molecular structure of hyaluronic acid so that the process for isolating and purifying hyaluronic acid from the medium can be simplified.