The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 1989

Filed:

May. 27, 1988
Applicant:
Inventors:

Akihiko Maezawa, Kanagawa, JP;

Yoshio Nakajima, Tokyo, JP;

Mitsuyoshi Kaneko, Tokyo, JP;

Shinji Aoki, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
2041573 ; 20415744 ; 2041582 ;
Abstract

A process for treating an effluent gas which includes the steps of leading an effluent gas containing sulfur oxides (SO.sub.x) and/or nitrogen oxides (NO.sub.x) to a radiation irradiation zone, adding ammonia (NH.sub.3) to the effluent gas before, during or after the irradiation, collecting resulting ammonium sulfate and/or ammonium nitrate by means of a dust collector, and releasing the effluent gas into the atmosphere. The desulfurization and/or denitration rate is improved by using as the dust collector a bag filter alone or a combination of an electrostatic precipitator and a bag filter, and adjusting the effluent gas temperature at the outlet of the bag filter within the range of from a temperature at which the humidity of the effluent gas is saturated to 100.degree. C.


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