The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1989
Filed:
Feb. 23, 1989
Applicant:
Inventor:
James M McDavid, Houston, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 233 ; 357 90 ;
Abstract
A transistor for VLSI devices made by the sidewall-spacer method uses a reach-through implant both before and after the sidewall spacer is defined. An arsenic implant self-aligned with the gate prior to the sidewall oxide, then a phosphorus implant and lateral diffusion performed after the sidewall oxide etch creates a reduced impurity concentration and graded junction for the reach-through implanted region beneath the oxide sidewall spacer. An arsenic implant after the sidewall spacer is in place provides heavily-doped low-resistance source/drain regions.