The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 1989

Filed:

Sep. 01, 1988
Applicant:
Inventors:

Dale L Critchlow, Burlington, VT (US);

John K DeBrosse, Essex Junction, VT (US);

Rick L Mohler, Williston, VT (US);

Wendell P Noble, Jr, Milton, VT (US);

Paul C Parries, Essex Junction, VT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
437200 ; 437201 ; 437192 ; 437 90 ; 437 83 ; 437 60 ; 437 52 ; 437967 ; 437968 ; 148D / ; 148D / ; 156612 ; 357236 ; 357 67 ;
Abstract

A method for forming a silicide bridge bewteen a diffusion region and an adjacent poly-filled trench separated by a thin dielectric. Silicon is selectively grown over exposed silicon regions under conditions that provide controlled lateral growth over the thin dielectric without also permitting lateral growth over other insulator regions. A refractory metal layer is then deposited and sintered under conditions that limit lateral silicide growth, forming the bridge. This process avoids the random fails produced by previous processes while enhancing the compatibility of bridge formation with shallow junctions, without introducing extra masking steps or other process complexities.


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