The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 1989
Filed:
May. 20, 1988
Applicant:
Inventors:
John A Baumann, Ossining, NY (US);
Rozalie Schachter, Flushing, NY (US);
Marcello Viscogliosi, Croton, NY (US);
Assignee:
American Cyanamid Company, Stamford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ; F01N / ;
U.S. Cl.
CPC ...
423210 ; 4232451 ; 422173 ; 42218629 ; 118723 ;
Abstract
Effluent process gases, particularly those employed in the production and processing of solid state electronic components, are cracked to form products having a condensed phase, which may be separated from the flowing process gas. A plasma trap comprises a high frequency coil for producing a plasma therein. The walls of the trap may be cooled and the trap may employ a removable wall on which the cracked product collects. Particular gases that may be treated are arsine, phosphine, disilane, silane, germane, organometallics and gases containing beryllium and boron.