The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 1989
Filed:
Jun. 30, 1988
Raymond Hayes, Beaverton, OR (US);
Denis L Heidtmann, Portland, OR (US);
Tektronix, Inc., Beaverton, OR (US);
Abstract
A CCD is fabricated from an intermediate product comprising a body of semiconductor material having a channel region of a first conductivity type bounded by a substrate region of a second, opposite conductivity type and a surface of the body, and first and second gates overlying the surface and spaced from each other. The method comprises introducing a dopant into the channel region by way of the surface of the body. The first and second gates are opaque with respect to the dopant. The dopant is such that it forms a zone within the channel region, beneath the space between the first and second gates, and the zone is of the first conductivity type and is of a higher doping concentration than other portions of the channel region. A third gate is formed over the surface of the body of semiconductor material, the third gate being at least partially disposed across the space between the first and second gates.