The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 1989

Filed:

Jun. 21, 1988
Applicant:
Inventors:

Masato Maeda, Tokyo, JP;

Hideo Takeuchi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
73 2 / ; 324204 ;
Abstract

A closed loop-like measuring passage is provided with two openings at symmetrical positions, and a sample gas is introduced through on opening into the passage and discharged therefrom through the other opening. A bypass pipe is connected to the measuring passage midway therealong, and a stable purge gas of known composition is introduced into the pipe from the center thereof. A magnetic field is generated in one of the two connecting portions between the bypass pipe and the measuring passage, and the oxygen gas attracting action of the field results in a change in the ratio of the split of the purge gas stream introduced into the bypass pipe and split into two streams. This change is detected by a pair of purge gas stream detecting sensors provided inside the bypass pipe symmetrically with respect to the portion through which the purge gas is introduced, and the thus detected signals are processed to obtain the difference between them which gives the oxygen gas concentration in the sample gas.


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