The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 1989
Filed:
Sep. 25, 1987
Yoshihiro Mochida, Tokyo, JP;
Takeyuki Sugimoto, Tokyo, JP;
Ichiro Shirahama, Tokyo, JP;
Naoshi Kiyomoto, Tokyo, JP;
ORC Manufacturing Co., Ltd., Tokyo, JP;
Abstract
Disclosed is a method of measuring and displaying double refraction. In this method measuring light which has been subjected to double refraction passes through the material to be measured at a point of measurement thereof. A surface of the material to be measured is disposed in a manner that the same is located at right angles, or is inclined with respect to an optical axis of the measuring light. The material is rotated about the point of measurement thereof on a plane which is perpendicular to the optical axis of the measuring light. The data on the double refraction is displayed together with a plus or minus sign thereof as a function of the angle of rotation, in the form of polar coordinates corresponding to the angle of rotation.