The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1989
Filed:
Jul. 13, 1988
Steven L Bard, Endwell, NY (US);
Claudius Feger, White Plains, NY (US);
John J Glenning, Vestal, NY (US);
Gareth G Hougham, Ossining, NY (US);
Steven E Molis, Yorktown Heights, NY (US);
Walter P Pawlowski, Endicott, NY (US);
John J Ritsko, Mt. Kisco, NY (US);
Peter Slota, Jr, Vestal, NY (US);
Randy W Snyder, Vestal, NY (US);
IBM Corporation, Armonk, NY (US);
Abstract
Polyimide is etched by contacting the polyimide with an aqueous solution of a metal hydroxide followed by contact with an acid followed by contact with an aqueous solution of a metal hydroxide. Etching of chemically cured polyimide can be enhanced by employing a presoaking in hot water. Also, partially etched chemically cured polyimide is removed with a concentrated acid solution. In preparing a metal coated polyimide structure for subsequent gold plating, two flash etching steps with the polyimide etch between are employed after developing the photoresist.