The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 1989

Filed:

May. 26, 1988
Applicant:
Inventors:

Masaki Suzuki, Osaka, JP;

Hiroyuki Nagano, Osaka, JP;

Takeo Sato, Kawasaki, JP;

Toshiyuki Watanabe, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350-62 ; 2504911 ;
Abstract

A scanning type projection exposure system includes a source emitting light. The light is applied to a portion of a mask having a preset pattern. At least one optical erect projection sub-system images a portion of the pattern on a substrate. The portion of the pattern corresponds to the portion of the mask exposed to the light. The projection sub-system is subjected to scanning movement. The mask and the substrate are subjected to scanning movement. Relative positions of the mask and the substrate are held fixed during the scanning movement of the mask and the substrate.


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