The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 1989
Filed:
Jun. 10, 1987
Takao Iwayanagi, Nerima, JP;
Norio Hasegawa, Nishitama, JP;
Toshihiko Tanaka, Setagaya, JP;
Hiroshi Shiraishi, Hachioji, JP;
Takumi Ueno, Hachioji, JP;
Michiaki Hashimoto, Yono, JP;
Seiichiro Shirai, Higashikurume, JP;
Kazuya Kadota, Nishitama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A thick polymer film containing an aromatic bisazide and/or an aromatic sulfonyl azide compound is formed on a substrate having topography level on its surface to flatten said surface and then heated or the whole surface thereof is exposed to a light. A mask pattern having a dry etching resistance higher than that of the polymer is formed on the polymer film, exposed parts of the polymer film are removed by the dry etching and the exposed parts of the film to be processed are removed to form a pattern.