The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 1989
Filed:
Oct. 17, 1985
Yukio Kembo, Yokohama, JP;
Yoshihiro Komeyama, Yokohama, JP;
Minoru Ikeda, Yokohama, JP;
Akira Inagaki, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile