The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1989
Filed:
Aug. 25, 1987
Applicant:
Inventor:
Karel D van der Mast, Pijnacker, NL;
Assignee:
U.S. Philips Corp., New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2503 / ; 2504922 ; 250398 ;
Abstract
In a beam shaper superpositions of a deformed first diaphragm and a deformed or non-deformed second diaphragm can be realized by means of a quadrupole system. As a result of this a great freedom for adapting the spot cross-section to the patterns to be formed is obtained, as a result of which the number of writing pulses per pattern and hence the writing time for, for example, a chip can be considerably reduced and in particular non-orthogonal and non-linear transistions in the patterns can be written with greater definition.