The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1989
Filed:
Feb. 19, 1987
Simon Garth, Cambridge, GB;
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
An electron beam apparatus in which the electron beam is directed to a sample and secondary electrons from the sample return in the direction of the beam and are deflected sideways to a collector by a first electrostatic deflection means. To compensate for distortion of the spot produced by the beam as a result of the first electrostatic deflection means, a similar deflection means is placed above the first means to correct the distortion and is so biased as to reflect secondary electrons which might otherwise pass the first means. The deflection means are 4-pole electrostatic stigmators. A threshold grid is biased to allow to pass to the first means only those secondary electrons having release speeds from the sample above a certain value.