The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1989
Filed:
May. 18, 1988
Applicant:
Inventors:
Cecil J Davis, Greenville, TX (US);
Lee M Loewenstein, Plano, TX (US);
Rhett B Jucha, Celeste, TX (US);
Robert T Matthews, Plano, TX (US);
Randall C Hildenbrand, Richardson, TX (US);
Dean W Freeman, Garland, TX (US);
John I Jones, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; H01L / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156345 ;
Abstract
A processing apparatus and method compatible with a vacuum process system for wafers, wherein an in situ source of ultraviolet light is provided to enhance chemical activity at the wafer surface, and a remote plasma source is provided in the process gas flow upstream of the wafer, to provide activated species to the wafer face, and a radiatively coupled heat source is also provided so that the wafer can be rapidly thermally cycled.