The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 1989
Filed:
Jan. 11, 1988
Lydia J Young, Palo Alto, CA (US);
Lee H Veneklasen, Castro Valley, CA (US);
The Perkin-Elmer Corporation, Norwalk, CT (US);
Abstract
Disclosed is a particle beam lithography system (10) having a workpiece loading/unloading position to one side of a particle beam (32) and beam column (12) where a workpiece (14), to be processed, is placed in a vacuum chuck (100) to eliminate any irregularity or warpage of the workpiece (14). At this same position, the workpiece (14) is oriented and fixed at a preselected distance from a standard by gap setting means (162, 162b). This distance correlates with a preselected gap (G) between a seal apparatus (16) and the workpiece (14) during workpiece processing. The workpiece (14) and chuck (100) are then moved beneath the seal apparatus (16) and beam column (12) for workpiece processing. After processing, the workpiece (14) and chuck (100) are returned to the loading/unloading position to be removed from the lithography system (10). An interface plate (64) is moved from the loading/unloading position to the workpiece processing position by an X-Y stage (50) and a workpiece transport system (130) is provided to transport the workpieces (14) to and from the lithography system (10) to appropriate cassettes (132,134).