The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 1989
Filed:
Mar. 10, 1988
Applicant:
Inventors:
Siegfried Birkle, Hoechstadt/Aisch, DE;
Recai Sezi, Roettenbach, DE;
Hans-Dieter Feucht, Erlangen, DE;
Rainer Leuschner, Grossenseebach, DE;
Assignee:
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B29C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 1566591 ; 156668 ; 156904 ; 427 431 ; 427 541 ; 430296 ;
Abstract
In generating resist structures according to bilayer technology a series of requirements is made of silicon-containing positive resists. The new method is intended to ensure, inter alia, the profile retention respectively the ability of the resist structures to maintain precise dimensions. According to the invention vinyl phenol-vinyl silane copolymers are used as resist materials.