The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 1989
Filed:
Feb. 27, 1987
Fujitsu Limited, Kawasaki, JP;
Abstract
Disclosed is a pattern matching method and apparatus, in which an object pattern is collated with a master pattern using pattern matching. As a first step, an area corresponding to a master pattern size is sequentially extracted from a master sample image for forming the master pattern, each extracted pattern is collated and the other patterns in the master sample image. An extracted pattern which has a minimum similarity to all the other patterns, and, as a result, shows the most distinctive pattern, is used for the master pattern. Using the present method and apparatus, pattern matching having a higher recognition rate can be performed. Further, using the present pattern matching method, an apparatus can be obtained for positioning the object to be recognized with a highest positioning accuracy.