The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 1989
Filed:
Feb. 17, 1987
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
In a GaAs field effect transistor of the invention, a gate layer is formed on a semi-insulative substrate. The gate layer is made of a conductive material forming a Schottky junction between the substrate and the gate layer. Source and drain regions are formed in the substrate to have a first conductivity type. Barrier layers are formed in the substrate to have a second conductivity type. The barrier layers are formed to surround the source and drain regions, and suppress a current component from leaking from the source and drain regions to the substrate when the field effect transistor is operative.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile