The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 1989

Filed:

Jun. 09, 1987
Applicant:
Inventors:

Koichi Ohno, Kanagawa, JP;

Kenji Higashi, Saitama, JP;

Hiroki Tateno, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 77 ; 356401 ;
Abstract

An apparatus having stage means on which a substrate is placed, holding means for holding a mask formed with at least one mark, and exposing means for exposing the image of said at least one mark on the exposure surface of the substrate which is coated with photoresist includes displacing means for imparting relative displacement between the stage means and the holding means, control means for controlling the exposing means and the displacing means and executing first exposure and second exposure successively, the control means executing the first and the second exposure of exposing the image of said at least one mark on a plurality of predetermined areas of the exposure surface of the substrate placed on the stage means, and controlling the exposing means and the displacing means so that the amount of deviation between the position of the image of said at least one mark in each of the predetermined areas during the first exposure and the position of said image during the second exposure assumes a predetermined value, developing means for developing the substrate in response to the termination of the second exposure, deviation amount detecting means for detecting the amount of deviation between the position of the image of said at least one mark in each of the predetermined areas of the developed substrate during the first exposure and the position of said image during the second exposure and making a detection signal, and determining means for determining the accuracy of the apparatus in accordance with the detection signal and the predetermined value.


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