The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 1989

Filed:

May. 21, 1987
Applicant:
Inventors:

Hiroaki Yamauchi, Kakogawa, JP;

Toragoro Mitani, Takasago, JP;

Takamichi Komabashiri, Takasago, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528229 ; 526 62 ; 526 74 ;
Abstract

A process for preparing a scale deposition preventing agent of a quinone-amine compound suitable for use in a polymerization of acrylic or methacrylic acid ester monomers, which comprises (A) subjecting an aromatic quinone and an aromatic diamine to addition reaction in a solvent having a solubility parameter of 8.5 to 24.0 to give an addition product, and (B) converting the addition product into a high molecular weight compound within 24 hours after beginning the addition reaction (A) by adding an oxidizing agent to the addition reaction mixture or by subjecting the addition reaction mixture to anodic oxidation with an electrode to give a quinone-amine compound. According to the present invention, the preparation rate of the scale deposition preventing agent of the quinone-amine compound can be remarkably increased, the yield can be increased, and the obtained compound has excellent properties.


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