The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 1988

Filed:

Sep. 03, 1987
Applicant:
Inventors:

Tsutomu Ishikawa, Kanagawa, JP;

Muneo Nakayama, Tokyo, JP;

Akira Hashimoto, Kanagawa, JP;

Toshihiro Nishimura, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K / ;
U.S. Cl.
CPC ...
10628713 ; 10628716 ;
Abstract

An improved silica-based film-forming composition for diffusion of antimony in the doping works of semiconductors is proposed which comprises an organic solvent, a partial hydrolysis product of an alkoxy silane compound and an antimony compound dissolved in the organic solvent. The antimony compound in the inventive composition is an alkoxy antimony or aryloxy antimony compound so that the problem of corrosion of the coating apparatus can be entirely avoided without decreasing the dopant concentration in the semiconductor substrate, as well as to provide a film-forming composition which is advantageously stable in storage.


Find Patent Forward Citations

Ishikawa, Tsutomu. (1988). Silica-based antimony containing film-forming composition (U.S. Patent No. 4793862). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4793862

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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