The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 1988
Filed:
Aug. 17, 1987
Applicant:
Inventors:
Andreas A Melas, Burlington, MA (US);
Norbert Braunagel, Karlsruhe, DE;
Assignee:
Morton Thiokol, Inc., Chicago, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
4272481 ; 427255 ; 4272552 ;
Abstract
A process for depositing a gallium nitride film on a substrate. A source compound is provided which has the formula:
Quick Actions:
Melas, Andreas. (1988). Method for vapor phase deposition of gallium nitride film (U.S. Patent No. 4792467). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4792467
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