The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 1988

Filed:

Oct. 07, 1987
Applicant:
Inventor:

Toshihiro Furuya, Katsuta, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250310 ; 2503 / ; 250307 ;
Abstract

Disclosed is an electron beam scanning method and a scanning electron microscope, wherein an electron beam scans an electrical insulation sample in reciprocative directions, with a time difference of n period(s) (n=0, 1, 2, . . . ) plus a half period of a.c. power or external a.c. magnetic field being provided between a scanning start time point in each scanning direction of the deflection magnetic field and a corresponding zero-cross point of the a.c. power or external magnetic field so as to reduce the sample shape measurement error caused by the difference of charging on the sample, thereby enhancing the accuracy of sample shape measurement.


Find Patent Forward Citations

Furuya, Toshihiro. (1988). Electron beam scanning method and scanning electron microscope (U.S. Patent No. 4791294). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4791294

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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