The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1988
Filed:
Nov. 17, 1987
Applicant:
Inventors:
Andrew G Nagy, Tempe, AZ (US);
Robert J Mattox, Tempe, AZ (US);
Assignee:
Motorola Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437 67 ; 156646 ; 156657 ;
Abstract
A method is described for forming dielectric filled isolation trenches in semiconductor substrates in which a differentially etchable etch-stop layer is provided above the surface of the substrate during the trench filling process so that the height of the trench filling relative to the surface of the substrate may be adjusted for optimum overall results during subsequent fabrication steps and so that the substrate surface may be protected from contact with the etching reagents used during planarization of the trench filling material. This avoids damage to the substrate surface and permits improved surface planarity.