The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1988
Filed:
Oct. 19, 1987
Yuji Takagi, Yokohama, JP;
Seiji Hata, Fujisawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method and an apparatus suitably used with a visual recognition system or the like for measuring the shape of an object by the optical cutting process is disclosed in which irregularities of the reflection characteristics on the object or under an environment subjected to variations in external light are removed for measurement. A light flux parallel to a slit beam providing an optical cutting beam is irradiated on the object by an optical system. An original image not irradiated with any parallel illumination light is compared with an image obtained with a parallel beam irradiated to obtain reflection characteristics data on the object. This reflection characteristic data is used to correct an image formed at the time of irradiation of the optical cutting beam. When the optical cutting beam is irradiated, the existing image representing reflection characteristics is standardized with reference to the brightness of the optical cutting beam. The resulting data is used to correct the differential image obtained by subtraction between the image irradiated with the optical cutting beam and the original image. The reflection irregularties are thus removed for an improved measurement accuracy.