The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 1988
Filed:
Sep. 17, 1986
Applicant:
Inventors:
Stanford R Ovshinsky, Bloomfield Hills, MI (US);
James Flasck, Rochester, MI (US);
Assignee:
Ovonic Synthetic Materials Company, Troy, MI (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B / ; B32B / ; B32B / ; C01B / ;
U.S. Cl.
CPC ...
428408 ; 428412 ; 428457 ; 428500 ; 428691 ; 428696 ; 428917 ; 423445 ;
Abstract
Disclosed is a method of forming a hard, carbonaceous film on a substrate and the hard carbonaceous film formed thereby. The hard carbonaceous film is formed by decomposing a gaseous hydrocarbon having carbon atoms tetrahedrally coordinated to its nearest neighbors through carbon-carbon single bonds. The gaseous hydrocarbon is decomposed in a radio frequency maintained plasma and the plasma decomposition products are deposited on a cathodic substrate. Optionally, fluorocarbons may be present in a decomposition gas.