The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 1988
Filed:
Aug. 13, 1987
Tadao Omata, Tokyo, JP;
Naoshi Kozu, Tokyo, JP;
ORC Manufacturing Co., Ltd., Tokyo, JP;
Abstract
Disclosed is a work alignment apparatus for double-sided exposure of a work which serves to convey to and locate the work in an exposing position such that the work is exposed on either side thereof between printing frames each holding an image mask on each corresponding side of the work. The work alignment apparatus comprises means for detecting and calculating an amount of misalignment between the work in the exposing position and each of the image masks, an alignment stage disposed outside the printing frames and adapted to determine a mounting position of the work in an alignment coordinate system in accordance with the misalignment, and means for conveying the work, in the mounting position located in the alignment coordinate system, to the exposing position.