The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 1988
Filed:
Feb. 28, 1983
Applicant:
Inventors:
Hisao Onishi, Hiroshima, JP;
Ryozo Numazawa, Otake, JP;
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F / ;
U.S. Cl.
CPC ...
210615 ; 435182 ; 210150 ; 210903 ; 21050023 ;
Abstract
A process for treating contaminated water containing BOD sources and nitrogen sources, which comprises supplying oxygen or oxygen-containing gas from one side of a gas-permeable membrane to grow microorganisms including aerobic bacteria and anaerobic bacteria on the other side of the gas-permeable membrane, and performing decomposition of the BOD sources and nitrification and denitrification simultaneously by the action of these microorganisms. Especially good results are obtained when a membrane composed of porous hollow fibers is used as the gas-permeable membrane.