The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1988
Filed:
May. 14, 1987
Robert G Massey, Whiteright, TX (US);
Donald W Heidt, Whiteright, TX (US);
Billy B Williams, Whiteright, TX (US);
Semitherm, Kalispell, MT (US);
Abstract
Vertically oriented thermal processor, also known as a vertical diffusion furnace for the processing of silicon or gallium arsenide wafers or substrates including a vertically positionable furnace assembly, and a quartz bell-jar shaped element which positions coaxially over and about another quartz bell jar like vertically positionable process tube forming a dual wall contamination barrier. The furnace and the process tube bell jar can be moved up and down pneumatically as a unit or independently of one another during processing modes. Pneumatic cylinders provide for the lifting of the furnace element away from the wafers to ramp temperatures downwardly at an accelerated rate. An overhead track positions for accelerated removal of the furnace and process tube to the exterior of the cabinet without disconnection of electrical, pneumatic or gas connections for maintenance or component changeout. A microprocessor controls and monitors all functions of the vertical thermal processor, and includes a rear microprocessor control as well as a front panel control. Silicon wafer loads can be loaded from the front, side or back by manual, softlander or robotic means.