The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1988
Filed:
Dec. 18, 1986
Erich Kny, Pflach, AT;
Schwarzkopf Development Corporation, New York, NY (US);
Abstract
Sputter targets and a process for producing sputter targets are provided, comprised of carbides and/or nitrides and/or borides of refractory metals. In a first step, a dense composite body is produced comprised of one or more carbides and/or nitrides and/or borides of the metals of Groups IV A-VI A of the periodic table and a metallic binding agent comprised of one or more metals of the iron group of the periodic table. This composite body in the form of a shaped blank is machined, if necessary, and the binding agent is removed by chemical or electrochemical treatment. The sputter target as so produced has excellent mechanical strength and high thermal shock resistance. Levels of contaminating elements and the residual metallic binding agent are extremely low, meeting the requirements typically placed on sputter targets.