The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 1988
Filed:
Apr. 07, 1986
Jes Asmussen, Okemos, MI (US);
Donnie K Reinhard, East Lansing, MI (US);
Mahmoud Dahimene, East Lansing, MI (US);
Board of Trustees operating Michigan State University, East Lansing, MI (US);
Abstract
An improved ion generating apparatus for producing a plasma disk using magnets 34 and 35 around a region 16 in a chamber 15 positioned in a microwave cavity is described. The apparatus is particularly operated at a microwave frequency such that electron cyclotron resonance is produced in the plasma to create an accelerating surface for the electrons around and inside of the plasma. The apparatus can be operated to treat an article 100 in the plasma or a holder 39, with a grid 51 to withdraw particles or with a magnets 47 around an opening 48 forming a nozzle which with electron cyclotron resonance produces a neutral beam of charged particles. The apparatus is particularly useful as a plasma source especially for oxidation, etching and deposition.