The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1988
Filed:
Nov. 12, 1985
Applicant:
Inventors:
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; B32B / ; G21K / ;
U.S. Cl.
CPC ...
430-5 ; 378 34 ; 378 35 ; 428428 ; 428432 ;
Abstract
A photomask material comprising a transparent glass substrate, a polysilicon layer formed on the transparent glass substrate, a transition metal film formed on the polysilicon layer, the metal film being capable of being etched by means of the same dry etching process as that used for the polysilicon layer, and a protective polysilicon layer formed on the transition metal film.