The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 1988
Filed:
May. 13, 1987
Applicant:
Inventor:
Seiichi Morimoto, Aloha, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156657 ; 156663 ; 252 793 ; 252 794 ; 4273762 ; 437228 ; 437235 ;
Abstract
Planarization process for planarizing glass layer which receives first layer metal. Spin-on-glass is cured in steam and then etched back using hydrofluoric and nitric acids diluted in acetic acids.
Morimoto, Seiichi. (1988). Semiconductor planarization process (U.S. Patent No. 4721548). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4721548
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile