The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1988
Filed:
Dec. 17, 1986
Shinji Tsutsui, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A pattern transfer apparatus for transferring a pattern of a mask onto a wafer. The apparatus includes a wafer chuck for holding the wafer at a position whereat the pattern of the mask is transferred onto the wafer. The temperature of the wafer held by the wafer chuck is controlled to expand/contract the wafer to achieve alignment of the pattern of the mask with a pattern which has already been formed on the wafer. A mechanism for preparatively adjusting the temperature of the wafer before it is moved to the wafer chuck is provided, whereby the time until the temperature of the wafer on the wafer chuck reaches a desired level is reduced and, therefore, throughput of the apparatus is improved. Further, any fluctuation in the temperature of the wafer chuck is prevented so that the reliability of alignment between the pattern of the mask and the pattern formed on the wafer is improved.