The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1988
Filed:
Oct. 06, 1986
Applicant:
Inventors:
Robert A Bowling, Garland, TX (US);
Graydon B Larrabee, Dallas, TX (US);
Benjamin Y Liu, North Oaks, MN (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C23C / ; B05D / ;
U.S. Cl.
CPC ...
156643 ; 156345 ; 156646 ; 118 501 ; 118620 ; 118729 ; 427 38 ; 2041921 ; 20419232 ; 204298 ;
Abstract
A vacuum processing system for processing semiconductor wafers includes a particle shield (16) disposed above the wafer (10) to block moving particles in a vacuum chamber which would otherwise contact the wafer (10). The particle shield (16) is attached to arm (18), allowing the particle shield (16) to be moved away from the wafer or photomask during processing.